Formation of Palladium Silicide Thin Layers on Si(110) Substrates

Suryana, Risa and Nakatsuka, Osamu and Zaima, Shigeaki (2011) Formation of Palladium Silicide Thin Layers on Si(110) Substrates. Japanese Journal of Applied Physics (50).

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    Abstract

    The formation of palladium silicide thin films from Pd/Si(110) and Pd/Si(001) systems with and without a Ti intermediate layer has been investigated. The existence of a Ti layer could improve the thermal stability of Pd2Si thin layers in Pd/Ti/Si(001). In addition, an epitaxial or highly oriented Pd2Si layer is formed in Pd/Ti/Si systems. However, the roughness of the Pd2Si/Si interface is observed in Pd/Ti/Si(110) systems, while the flatnesses of the Pd2Si/Si interface is observed in Pd/Ti/Si(001).

    Item Type: Article
    Subjects: Q Science > Q Science (General)
    Divisions: Fakultas Matematika dan Ilmu Pengetahuan Alam > Fisika
    Depositing User: mr azis r
    Date Deposited: 23 May 2013 21:32
    Last Modified: 23 May 2013 21:32
    URI: https://eprints.uns.ac.id/id/eprint/854

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