Formation of Palladium Silicide Thin Layers on Si(110) Substrates

Suryana, Risa and Nakatsuka, Osamu and Zaima, Shigeaki (2011) Formation of Palladium Silicide Thin Layers on Si(110) Substrates. Japanese Journal of Applied Physics, 50.

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    Abstract

    The formation of palladium silicide thin films from Pd/Si(110) and Pd/Si(001) systems with and without a Ti intermediate layer has been investigated. The existence of a Ti layer could improve the thermal stability of Pd2Si thin layers in Pd/Ti/Si(001). In addition, an epitaxial or highly oriented Pd2Si layer is formed in Pd/Ti/Si systems. However, the roughness of the Pd2Si/Si interface is observed in Pd/Ti/Si(110) systems, while the flatnesses of the Pd2Si/Si interface is observed in Pd/Ti/Si(001).

    Item Type: Article
    Subjects: T Technology > TA Engineering (General). Civil engineering (General)
    T Technology > TH Building construction
    Divisions: Lembaga Penelitian dan Pengabdian Kepada Masyarakat - LPPM
    Depositing User: Anis Fagustina
    Date Deposited: 26 Apr 2014 17:10
    Last Modified: 26 Apr 2014 17:10
    URI: https://eprints.uns.ac.id/id/eprint/13362

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