WARSITI, (2005) STUDI PENGARUH SUHU ANNEALING TERHADAP STRUKTUR KRISTAL DAN MAGNETORESISTANSI PERMALLOY NiFe HASIL ELEKTRODEPOSISI. Other thesis, UNIVERSITAS SEBELAS MARET.
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ABSTRACT Study About Annealing Temperature Influence To Crystal Structure And Magnetoresistance Permalloy NiFe by Electrodeposition Technique By Warsiti M 0201010 The growth of NiFe thin film by electrodeposition technique have been done. Annealing was done to improve magnetoresistance ratio of thin film. The result showed that crystal structure of NiFe thin film was face center cubic (FCC). Variation of annealing temperature did not influence the crystal stucture of thin film. The crystal planes of thin film are (111), (200), and (220). The result also showed that the increasing of annealing temperature can increase the magnetoresistance value of NiFe thin film. Maximum magnetoresistance ratio is10,22 % that have obtained on sample which have temperature electrolit 50°C and annealed on 150C.
|Item Type:||Thesis (Other)|
|Subjects:||Q Science > QC Physics|
|Divisions:||Fakultas Matematika dan Ilmu Pengetahuan Alam > Fisika|
|Depositing User:||Saputro Bagus|
|Date Deposited:||14 Jul 2013 20:20|
|Last Modified:||14 Jul 2013 20:20|
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